Author

Pedersen H

Professor in Inorganic Chemistry, Link

Biography

Pedersen H is currently an Assistant Professor at the College of Health Technologies and Pharmaceuticals, Division of Health Systems and Public Health, WHO Regional Office for Europe, Copenhagen, Denmark and participated in several high-profile conferences. In addition to his academic career, Dr Pedersen H  held several managerial positions in the United Arab Emirates and New Zealand.
Title
Cited by
Year
Precursors for carbon doping of GaN in chemical vapor deposition
X Li, Ö Danielsson, H Pedersen, E Janzén, U ForsbergJournal of Vacuum Science & Technology B 33 (2), 2015201
47
2015
Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results
X Li, J Bergsten, D Nilsson, Ö Danielsson, H Pedersen, N Rorsman, ...Applied Physics Letters 107 (26), 2015201
42
2015
Atomic layer deposition of InN using trimethylindium and ammonia plasma
P Deminskyi, P Rouf, IG Ivanov, H PedersenJournal of Vacuum Science & Technology A 37 (2), 2019201
35
2019
Challenge in determining the crystal structure of epitaxial 0001 oriented sp2-BN films
M Chubarov, H Högberg, A Henry, H PedersenJournal of Vacuum Science & Technology A 36 (3), 2018201
31
2018
A model for carbon incorporation from trimethyl gallium in chemical vapor deposition of gallium nitride
Ö Danielsson, X Li, L Ojamäe, E Janzén, H Pedersen, U ForsbergJournal of Materials Chemistry C 4 (4), 863-871, 2016201
31
2016
Polytype Pure sp2-BN Thin Films As Dictated by the Substrate Crystal Structure
M Chubarov, H Pedersen, H Högberg, Z Czigány, M Garbrecht, A HenryChemistry of Materials 27 (5), 1640-1645, 2015201
31
2015
In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
NJ O’Brien, P Rouf, R Samii, K Rönnby, SC Buttera, CW Hsu, IG Ivanov, ...Chemistry of Materials 32 (11), 4481-4489, 2020202
30
2020
Gas phase chemical vapor deposition chemistry of triethylboron probed by boron–carbon thin film deposition and quantum chemical calculations
M Imam, K Gaul, A Stegmüller, C Höglund, J Jensen, L Hultman, J Birch, ...Journal of Materials Chemistry C 3 (41), 10898-10906, 2015201
29
2015
Time as the Fourth Dimension: Opening up New Possibilities in Chemical Vapor Deposition
H PedersenChemistry of Materials 28 (3), 691-699, 2016201
25
2016
Gas phase chemistry of trimethylboron in thermal chemical vapor deposition
M Imam, L Souqui, J Herritsch, A Stegmüller, C Höglund, S Schmidt, ...The Journal of Physical Chemistry C 121 (47), 26465-26471, 2017201
24
2017
The endocyclic carbon substituent of guanidinate and amidinate precursors controlling atomic layer deposition of InN films
P Rouf, NJ O’Brien, K Rönnby, R Samii, IG Ivanov, L Ojamäe, ...The Journal of Physical Chemistry C 123 (42), 25691-25700, 2019201
24
2019
Initial stages of growth and the influence of temperature during chemical vapor deposition of sp2-BN films
M Chubarov, H Pedersen, H Högberg, A Henry, Z CzigányJournal of Vacuum Science & Technology A 33 (6), 2015201
21
2015
Epitaxial GaN using Ga (NMe 2) 3 and NH 3 plasma by atomic layer deposition
P Rouf, NJ O’Brien, SC Buttera, I Martinovic, B Bakhit, E Martinsson, ...Journal of Materials Chemistry C 8 (25), 8457-8465,
20
2020
Surface-Inhibiting Effect in Chemical Vapor Deposition of Boron–Carbon Thin Films from Trimethylboron
L Souqui, H Högberg, H PedersenChemistry of Materials 31 (15), 5408-5412, 202
19
2019
Trimethylboron as single-source precursor for Boron–Carbon thin film synthesis by plasma chemical vapor deposition
M Imam, C Höglund, J Jensen, S Schmidt, IG Ivanov, R Hall-Wilton, ...The Journal of Physical Chemistry C 120 (38), 21990-21997, 2016201
18
2016
Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition
H Pedersen, ST Barry, J SundqvistJournal of Vacuum Science & Technology A 39 (5), 2021202
16
2021
Hexacoordinated gallium (III) triazenide precursor for epitaxial gallium nitride by atomic layer deposition
P Rouf, R Samii, K Ronnby, B Bakhit, SC Buttera, I Martinovic, L Ojamae, ...Chemistry of Materials 33 (9), 3266-3275, 2021202
14
2021
Silicon chemistry in fluorinated chemical vapor deposition of silicon carbide
P Stenberg, P Sukkaew, I Farkas, O Kordina, E Janzén, L Ojamae, ...The Journal of Physical Chemistry C 121 (5), 2711-2720, 2017201
14
2017
Thermal chemical vapor deposition of epitaxial rhombohedral boron nitride from trimethylboron and ammonia
L Souqui, H Pedersen, H HögbergJournal of Vacuum Science & Technology A 37 (2), 2019201
13
2019
Chemical vapor deposition of metallic films using plasma electrons as reducing agents
H Nadhom, D Lundin, P Rouf, H PedersenJournal of Vacuum Science & Technology A 38 (3), 2020202
13
2020

Referred From: https://scholar.google.se/citations?user=XAXw7OUAAAAJ&hl=sv

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Citations 2726
h-index 28
i10-index 68
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